英语翻译The Filtered Arc Deposition (FAD) system based on the ‘e

英语翻译
The Filtered Arc Deposition (FAD) system based on the ‘enhanced arc’ principle is suitable to deposit high quality electrical and optical coatings [44].
A recent trend has been to combine the advantages of sputtering and cathodic arc techniques.The Arc Bond Sputter (referred to as ABS) PVD technique was developed by combining the features of steered cathodic arc and unbalanced magnetron processes [33,36?/39].This technique yields coatings with high levels of adhesion,dense structure,and provides a smooth macro particle free surface.In the ABS technique,the cathodes can be evaporated either by the arc method or the sputtering method.In some cases,the arc mode was used only to metal ion etch or bombard the substrate prior to actual coating deposition by unbalanced magnetron sputtering [34?/36].A hybrid arc-magnetron process (where magnetron sputtering of a pure aluminum cathode was coupled with cathodic arc vaporation of a TiAl alloy cathode) resulted in a (Ti,Al)N coating with a low number of macro particles and excellent adhesion [39].Donohue et al.[33] suggested deposition of highly reactive elements,such as Group IVa elements,by steered arc mode,and of less reactive elements,by unbalanced magnetron sputtering mode.The approach
by Donohue et al.[33] minimized poisoning of targets by reactive gases,especially when the reactivity of the elements differ widely.
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